Question
Describe the set up used for ionized cluster beam (ICB) deposition. What are the advantages of this method?
Answer :
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Ionized Cluster Beam (ICB) deposition is a thin film deposition technique that combines the principles of molecular beam epitaxy and ion beam methods to achieve precise control over film composition and structure at the nanoscale. The setup consists of three main parts: the cluster source, the ionization chamber, and the deposition chamber. In the cluster source, the material to be deposited is heated in a crucible under vacuum, producing vaporized atoms that are subsequently
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